The array substrate and its manufacturing method of fringe field switching mode LCD

The array substrate and its manufacturing method of fringe field switching mode LCD

  • CN 103,901,686 B
  • Filed: 12/18/2013
  • Issued: 07/27/2018
  • Est. Priority Date: 12/26/2012
  • Status: Active Grant
First Claim
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1. a kind of method of array substrate of manufacture for fringe field switching mode LCD, the method includes:

  • Form grid line, gate pads and data pads in one direction on one surface of the insulating substrate there;

    Active layer is being formed from the grid that the grid line extends;

    Transparent conductive material layer and metal layer are sequentially formed in the whole surface of the insulating substrate including active layer;

    Levelling blanket is formed on the metal layer;

    Levelling blanket is patterned to form smooth layer pattern using half-tone mask;

    Metal layer and transparent conductive material layer are removed using smooth layer pattern as mask, with formation by metal conductive patterns and thoroughlyThe data line and source electrode that bright conductive pattern is constituted;

    Remove the smooth layer pattern and metal layer on pixel region, with formed be made of the single layer structure of transparent conductive patterns it is bigPixel electrode;

    Passivation layer is formed in the whole surface of the insulating substrate with the big pixel electrode;

    Form gate pads contact hole and data contact pads hole on the passivation layer, the gate pads contact hole and describedData pads contact hole exposes the gate pads and the data pads respectively;

    WithPublic electrode, the public electrode and the big pixel electrode and the data line overlap are formed on the passivation layer;

    The wherein described big pixel electrode is used as draining.

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