Plasma processing device and method of operating the same

Plasma processing device and method of operating the same

  • CN 103,943,451 A
  • Filed: 01/17/2014
  • Published: 07/23/2014
  • Est. Priority Date: 01/17/2013
  • Status: Active Application
First Claim
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1. a plasma processing apparatus, is characterized in that, comprising:

  • The container handling of storage handled object;

    Export multiple high frequency electric sources of the high frequency relevant to the plasma generating in described container handling;

    To the multiple reflected wave test sections that detect respectively to the reflected wave of described multiple high frequency electric sources;

    The electric power control part that the output of described multiple high frequency electric sources is controlled;

    Blocking control part, the detected value of its reflected wave in any of described multiple high frequency electric sources exceedes the predefined blocking to each high frequency electric source to be used threshold value, and blocking is the supply of the high frequency of described multiple high frequency electric sources all;

    WithThreshold portion, in any of described multiple high frequency electric sources, starting the moment of supply high frequency or making the moment of exporting change that described blocking threshold value is all set as to relatively high level, whole for described multiple high frequency electric sources switch to relatively low level by described blocking with threshold value whole after the supply of high frequency is stable.

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