Method and apparatus for producing a reflection-reducing layer on a substrate

Method and apparatus for producing a reflection-reducing layer on a substrate

CN
  • CN 103,959,425 A
  • Filed: 09/28/2012
  • Published: 07/30/2014
  • Est. Priority Date: 09/28/2011
  • Status: Active Application
First Claim
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1. the equipment (1) for the surface in plastic-substrates (20) (21) upper manufacture antireflection layer,-comprise the first sputter equipment (3), for base layers (22) being applied to the surface (21) of described plastic-substrates (20),-comprise plasma source (4), for the plasma etch process of the substrate surface after being coated with (21),-preferably include the second sputter equipment (5), for protective layer (24) is applied to described substrate surface (21),-comprise at least one entrance (8) at least one processing gas,It is characterized in that-described equipment (1) comprises vacuum chamber (2), has wherein configured processing unit (plant) (3,4,5), and-described equipment (1) comprises transfer equipment (10), for the mobile described substrate (20) between described processing unit (plant) (3,4,5) of the inside at described vacuum chamber (2).

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