Apparatus to Improve Internal Wafer Temperature Profile

Apparatus to Improve Internal Wafer Temperature Profile

  • CN 103,977,981 A
  • Filed: 05/08/2013
  • Published: 08/13/2014
  • Est. Priority Date: 02/08/2013
  • Status: Active Grant
First Claim
Patent Images

1. a wafer cleaner instrument, comprising:

  • Processing Room, is configured to holding semiconductor wafer;

    Dispense arm, is configured to described semiconductor crystal wafer high-temperature cleaning solution is provided;

    AndHeating Cup, in described Processing Room, be arranged on the position around the periphery of described semiconductor crystal wafer, and be configured to produce heat, the amount that described heat raises the outer peripheral temperature of described semiconductor crystal wafer is greater than the amount of the temperature rising at the center of described semiconductor crystal wafer.

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