Manufacturing method for gas barrier film, and electronic member or optical member provided with gas barrier film

Manufacturing method for gas barrier film, and electronic member or optical member provided with gas barrier film

  • CN 104,114,287 A
  • Filed: 11/28/2012
  • Published: 10/22/2014
  • Est. Priority Date: 11/30/2011
  • Status: Active Application
First Claim
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1. a manufacture method for gas barrier film, it is the manufacture method at least with the gas barrier film of the base material that comprises synthetic resin and the gas barrier layer forming on this base material, it is characterized in that having following operation:

  • Operation 1 is following operation;

    on described base material, to contain silicon be that the silicon of macromolecular compound and organic solvent is macromolecular compound solution in application, it by the silicon obtaining, is the heat drying of filming of macromolecular compound solution, form and contain the layer that silicon is macromolecular compound thusWhen the combination of described base material and organic solvent impregnated in described base material in this organic solvent 72 hours at 23 ℃

    , measure, the gel fraction of described base material is the combination more than 70%, lower than 98%;

    Operation 2 is following operations;

    by containing, to be formed with silicon be that the layer of macromolecular compound carries out Cement Composite Treated by Plasma and forms gas barrier layer.

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