Polishing agent, polishing agent set, and substrate polishing method

Polishing agent, polishing agent set, and substrate polishing method

  • CN 104,137,232 A
  • Filed: 02/14/2013
  • Published: 11/05/2014
  • Est. Priority Date: 02/21/2012
  • Status: Active Application
First Claim
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1. a grinding agent, it contains:

  • water, abrasive particle, PAG and the cation property copolymer of hydroxide that comprises tetravalent metal element, wherein, cation property copolymer selects at least one in the cohort that free allylamine polymer, diallyl amine polymer, vinyl amine polymer and epomine form.

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