Manufacture method of TFT array substrate, and structure of the TFT array substrate

Manufacture method of TFT array substrate, and structure of the TFT array substrate

  • CN 104,157,612 A
  • Filed: 08/21/2014
  • Published: 11/19/2014
  • Est. Priority Date: 08/21/2014
  • Status: Active Application
First Claim
Patent Images

1. a manufacture method for tft array substrate, is characterized in that, comprises the steps:

  • Step 1, provide a substrate (1), at this substrate (1) upper deposition the first metal layer patterning, form the first metal electrode (2);

    Step 2, at upper gate insulator (3) and the island semiconductor layer (4) of forming of described the first metal electrode (2) and substrate (1);

    Step 3, at gate insulator (3) and island semiconductor layer (4) upper deposition the second metal level patterning, form the second metal electrode (6);

    Step 4, at described the second metal electrode (6) upper deposition protective layer patterning, form protective layer (8);

    Step 5, at described protective layer (8) upper coating color blocking layer (7), at described color blocking layer (7) upper deposition protective layer patterning, form protective layer (12), and at protective layer (8), color blocking layer (7) and the upper via hole (81) that forms of protective layer (12);

    Step 6, at upper pixel electrode layer and the organic material layer (10) of forming of described protective layer (12) and the second metal electrode (6).

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