High Purity Ytterbium, Sputtering Target Made Thereof, Thin Film Containing the Same, and Method of Producing the Same

High Purity Ytterbium, Sputtering Target Made Thereof, Thin Film Containing the Same, and Method of Producing the Same

  • CN 104,232,946 A
  • Filed: 09/24/2008
  • Published: 12/24/2014
  • Est. Priority Date: 10/23/2007
  • Status: Active Application
First Claim
Patent Images

1. a high-purity ytterbium, is characterized in that, the purity except rare earth element and gaseous constituent is more than 4N, and each element of alkali and alkaline earth metal ions is respectively below 50 weight ppm.

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