Gas separation and supply device for semiconductor manufacturing apparatus

Gas separation and supply device for semiconductor manufacturing apparatus

  • CN 104,246,642 A
  • Filed: 04/01/2013
  • Published: 12/24/2014
  • Est. Priority Date: 04/27/2012
  • Status: Active Application
First Claim
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1. a gas distribution feedway for semiconductor-fabricating device, is characterized in that,Possess:

  • Operation valve (3), forms the pressure type flow rate control part (1a) be connected with process gas access (11);

    Gas supply supervisor (8), is communicated with the downstream of operation valve (3);

    Multiple branch line (9a, 9n), in the downstream of gas supply supervisor (8) with also column-shaped connection;

    Branch line open and close valve (10a, 10n), is located in each branch line (9a, 9n);

    Throttle orifice (6a, 6n), is arranged at the downstream of branch line open and close valve (10a, 10n);

    Temperature sensor (4), is arranged near the process gas passage between above-mentioned operation valve (3) and throttle orifice (6a, 6n);

    Pressure transducer (5), is arranged on the process gas passage between above-mentioned operation valve (3) and throttle orifice (6a, 6n);

    Shunt gas outlet (11a, 11n), is arranged on the outlet side of above-mentioned throttle orifice (6a, 6n);

    And the calculation control unit (7) to be made up of pressure type flow rate calculation control unit (7a), described pressure type flow rate calculation control unit (7a) is transfused to from the pressure signal of above-mentioned pressure transducer (5) and the temperature signal from temperature sensor (4), the total flow (Q) of computing process gas of circulation in above-mentioned throttle orifice (6a, 6n), and control signal (Pd) is exported to valve drive division (3a), the direction on-off action that described control signal (Pd) makes above-mentioned operation valve (3) reduce to the difference of the flow value calculated and flow setting value;

    Be configured to, the process gas flow being carried out circulation in each throttle orifice (6a, 6n) by above-mentioned pressure type flow rate control part (1a) controls.

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