Chemical deposition chamber with gas seal

Chemical deposition chamber with gas seal

  • CN 104,250,728 B
  • Filed: 06/30/2014
  • Issued: 10/02/2020
  • Est. Priority Date: 06/28/2013
  • Status: Active Grant
First Claim
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1. A system for sealing a processing zone in a chemical deposition apparatus, the system comprising:

  • a chemically isolated chamber having a deposition chamber formed therein;

    a showerhead module having a face plate and a backing plate, the showerhead module including a plurality of inlets to deliver reactor chemistry from a central plenum into a cavity for processing semiconductor substrates and to remove reactor chemistry and inert gas from the cavity to an intermediate plenum, an exhaust port located within the face plate, and an outer plenum configured to deliver inert gas, the exhaust port surrounding the inlets and the outer plenum being formed between an outer periphery of the face plate and an inner periphery of a spacer ring;

    a base module configured to support a substrate and to move vertically to close the cavity with a narrow gap between the base module and a step around an outer portion of the panel, the step surrounding the discharge opening;

    an inert sealing gas feed configured to feed the inert sealing gas into the outer plenum, and wherein the inert sealing gas flows at least partially radially inward through the narrow gap under the step of the panel to form a gas seal between the step and the base module; and

    an annular evacuation channel formed within an outer portion of the susceptor module that removes the inert sealing gas flowing radially inward through the narrow gap and from a region around a perimeter of a substrate on an upper surface of the susceptor module.

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