Plasma treatment corn seed and cultivation method for matching

Plasma treatment corn seed and cultivation method for matching

CN
  • CN 104,255,230 B
  • Filed: 09/04/2014
  • Issued: 03/16/2016
  • Est. Priority Date: 09/04/2014
  • Status: Active Grant
First Claim
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1. plasma treatment corn seed and cultivation method for matching, it is characterized in that, the method of plasma treatment seed is:

  • adopt the DL-2 type plasma processor that Dalian BoShi plasma Co., Ltd produces, treatment dosage is 1.6-1.8A, process twice, seed flow is 5.0-5.5kg/min, sowing in 8-12 days after process;

    With the cultivation method that plasma treatment seed is supporting be;

    (1) select suitable breeding time kind when identical ecotope does not change planting type, select the comparatively conventional kind breeding time kind of long 15-20 days;

    Or when identical ecotope does not change planting type, select to commonly use kind breeding time, but to postpone to sow 15-20 days;

    Or need former the ecotope that covering with plastic film ability is ripe, select to commonly use kind breeding time, do not change sowing time, do not need covering with plastic film again;

    (2) rational application of fertilizer uses sufficient long-acting nitrogen, phosphorus, K composite fertilizer before broadcasting, and vegetative period is Nitrogen Top Dressing 15 kgs/acre when plant height 115-120cm, filling stage Nitrogen Top Dressing 10 kgs/acre;

    (3) water in vegetative period and filling stage in good time, should water in time if there is arid.

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