Negative type photosensitive resin composition of the insulating film and insulating film using the same

Negative type photosensitive resin composition of the insulating film and insulating film using the same

  • CN 104,570,607 A
  • Filed: 09/24/2014
  • Published: 04/29/2015
  • Est. Priority Date: 09/24/2013
  • Status: Active Application
First Claim
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1. a photosensitive resin composition, described composition comprises:

  • (A) alkali soluble resins, described alkali soluble resins comprises (a1) derived from ethylenically unsaturated carboxylic acids, the structural unit of ethylenically unsaturated carboxylic acids acid anhydride or its potpourri, (a2) derived from the structural unit of the monomer of formula 1 expression, (a3) derived from the structural unit of the monomer of formula 2 expression, (a4) derived from the structural unit of alefinically unsaturated compounds, described structural unit is different from any one in structural unit (a1)-(a3), wherein the total amount of the structural unit (a2) that comprises of alkali soluble resins and (a3) is 10-50mol%, mole total amount of structure based unit,(B) monomer of photopolymerization;

    With(C) Photoepolymerizationinitiater initiater

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