Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device

Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device

  • CN 104,725,555 A
  • Filed: 12/19/2014
  • Published: 06/24/2015
  • Est. Priority Date: 12/19/2013
  • Status: Active Application
First Claim
Patent Images

1. a multipolymer, it comprises the repeating unit being derived from following monomer:

  • The monomer unstable to acid of general formula (I);

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×