An environment control device of an extreme ultraviolet lithography device projection system

An environment control device of an extreme ultraviolet lithography device projection system

  • CN 104,749,893 A
  • Filed: 12/30/2013
  • Published: 07/01/2015
  • Est. Priority Date: 12/30/2013
  • Status: Active Grant
First Claim
Patent Images

1. an environment control unit for extreme ultraviolet photolithographic equipment optical projection system, comprises cavity body structure, gas supply device, pump group and monitoring device, and wherein, gas supply device can be deposited, purified treatment gas, and regulable control gas mass flow;

  • Pump group can vacuumize cavity body structure, maintains cavity body structure vacuum environment;

    Monitoring device is for monitoring the dividing potential drop of component in cavity body structure vacuum tightness, cavity body structure, it is characterized in that;

    described cavity body structure comprises main chamber, work stage chamber and interface channel, mutually isolated between described each chamber, interface channel two ends are removable is respectively sealedly attached to main chamber and work stage chamber.

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