Post-processing method and use method of mask having defect pattern

Post-processing method and use method of mask having defect pattern

  • CN 104,898,370 A
  • Filed: 03/07/2014
  • Published: 09/09/2015
  • Est. Priority Date: 03/07/2014
  • Status: Active Application
First Claim
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1. there is a post-processing approach for the mask plate of defect pattern, it is characterized in that, comprising:

  • There is provided a mask plate, described mask plate comprises multiple pattern, and one or more pattern has defect;

    In the quartz glass at the defective pattern place of tool, shade is formed to reduce the transmittance with the quartz glass at defect pattern place by laser.

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