Doped element-variable and adjustable sputtering target and production process for same

Doped element-variable and adjustable sputtering target and production process for same

  • CN 104,962,870 A
  • Filed: 07/01/2015
  • Published: 10/07/2015
  • Est. Priority Date: 07/01/2015
  • Status: Active Application
First Claim
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1. the sputtering target material of a variable adjustable doped element, it is characterized in that:

  • comprise body, build-in district, described body is provided with multiple build-in district, described build-in district is evenly arranged on the actual sputter area on body, difference build-in different quantities and different types of doped element in described each build-in district;

    The surface in described body and build-in district maintains an equal level.

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