PROCESS FOR PRODUCING A GALLIUM ARSENIDE SUBSTRATE, GALLIUM ARSENIDE SUBSTRATE AND USE THEREOF

PROCESS FOR PRODUCING A GALLIUM ARSENIDE SUBSTRATE, GALLIUM ARSENIDE SUBSTRATE AND USE THEREOF

  • CN 104,969,328 A
  • Filed: 02/12/2014
  • Published: 10/07/2015
  • Est. Priority Date: 02/15/2013
  • Status: Active Application
First Claim
Patent Images

1. , for the preparation of the method for surface treated gallium arsenide substrate, said method comprising the steps of:

  • A) gallium arsenide substrate is provided;

    B) by UV irradiation and/or ozone gas, oxidation processes is carried out at least one surface of gallium arsenide substrate in dry conditions;

    C) at least one surface described of described gallium arsenide substrate is made to contact with at least one liquid medium;

    WithD) the dry described gallium arsenide substrate of kalimeris Pueraria lobota Buddhist nun (Marangoni) formula.

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