Method for producing a gallium arsenide substrate, gallium arsenide substrate and use thereof

Method for producing a gallium arsenide substrate, gallium arsenide substrate and use thereof

  • CN 104,969,328 B
  • Filed: 02/12/2014
  • Issued: 07/10/2020
  • Est. Priority Date: 02/15/2013
  • Status: Active Grant
First Claim
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1. A method for preparing a surface treated gallium arsenide substrate, the method comprising the steps of:

  • a) providing a gallium arsenide substrate;

    b) subjecting at least one surface of the gallium arsenide substrate to an oxidation treatment by means of UV irradiation and/or ozone gas under dry conditions;

    c) -1 contacting the at least one surface of the gallium arsenide substrate with an aqueous alkaline solution;

    c) -2 subsequently contacting the at least one surface of the gallium arsenide substrate with water, andc) -3 subsequently contacting said at least one surface of said gallium arsenide substrate with an acidic aqueous solution in the presence of ozone as oxidant;

    c) -4 contacting the at least one surface of the gallium arsenide substrate with water, wherein the water at least initially contains a pH-altering additive;

    andd) drying the gallium arsenide substrate in a Marangoni (Marangoni) format.

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