Susceptors for enhanced process uniformity and reduced substrate slippage

Susceptors for enhanced process uniformity and reduced substrate slippage

  • CN 105,009,272 A
  • Filed: 03/07/2014
  • Published: 10/28/2015
  • Est. Priority Date: 03/15/2013
  • Status: Active Application
First Claim
Patent Images

1. a substrate support, described substrate support comprises:

  • Base plate, described base plate has top surface;

    Groove, described groove type is formed in described top surface, and wherein said groove is by fringe enclosing;

    WithMultiple reclined support element, described multiple reclined support element is arranged in described groove, and described multiple support component is along the described edge setting of described groove, wherein each reclined support element comprises first surface, and described first surface is downward-sloping towards the center of described groove.

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