Planarized extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor

Planarized extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor

  • CN 105,027,258 A
  • Filed: 03/12/2014
  • Published: 11/04/2015
  • Est. Priority Date: 03/12/2013
  • Status: Active Application
First Claim
Patent Images

1. the extreme ultraviolet blank production system integrated, described production system comprises:

  • Vacuum chamber, described vacuum chamber is used for substrate to place in a vacuum;

    First depositing system, described first depositing system is for deposited planarization layer in described substrate, and described planarization layer has the top surface of planarization;

    AndSecond depositing system, described second depositing system, and does not need described substrate to shift out from described vacuum in described planarization layer for deposit multilayer stacking material.

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