Method for removing photoresist

Method for removing photoresist

  • CN 105,093,864 A
  • Filed: 08/24/2015
  • Published: 11/25/2015
  • Est. Priority Date: 08/24/2015
  • Status: Active Application
First Claim
Patent Images

1. remove a method for photoresist, it is characterized in that, comprise the following steps:

  • Wet etching is used to remove photoresist;

    Acid solution washing is used to scribble the photoresist of fibre faceplate;

    Add hot alkaline solution, use aqueous slkali soaking washing;

    Continue to pass into ozone in aqueous slkali;

    Use liquor potassic permanganate washing by soaking;

    With an organic solvent soak;

    Use deionized water rinsing.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×