Manufacturing methods of thin film transistor and array substrate, array substrate and display device

Manufacturing methods of thin film transistor and array substrate, array substrate and display device

  • CN 105,097,552 A
  • Filed: 08/14/2015
  • Published: 11/25/2015
  • Est. Priority Date: 08/14/2015
  • Status: Active Application
First Claim
Patent Images

1. a preparation method for thin-film transistor, comprising:

  • Underlay substrate is formed the pattern of semiconductor layer;

    The pattern of described semiconductor layer is formed the first photoetching agent pattern, described first photoetching agent pattern comprises the first thickness photoresist and the second thickness photoresist, the region of channel region to be formed in the pattern of the corresponding described semiconductor layer of described first thickness photoresist, the region of source electrode light doping section to be formed and drain electrode light doping section in the pattern of the corresponding described semiconductor layer of described second thickness photoresist;

    The thickness of described first thickness photoresist is greater than the thickness of described second thickness photoresist;

    With described first photoetching agent pattern for stopping that mask carries out heavy doping ion injection technology to the pattern of described semiconductor layer, form the pattern of source electrode heavily doped region and drain electrode heavily doped region;

    Ashing process is carried out to described first photoetching agent pattern, to remove described second thickness photoresist, and thinning described first thickness photoresist, form the second photoetching agent pattern;

    With described second photoetching agent pattern for stopping that mask carries out light dope ion implantation technology to the pattern of described semiconductor layer, form the pattern of channel region, source electrode light doping section and the light doping section that drains;

    AndRemove described second photoetching agent pattern.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×