PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

  • CN 105,140,094 A
  • Filed: 05/25/2015
  • Published: 12/09/2015
  • Est. Priority Date: 05/26/2014
  • Status: Active Application
First Claim
Patent Images

1. a plasma treatment appts, is characterized in that, possesses:

  • Process chamber;

    Plasma source, produces plasma in described process chamber;

    Moving carrier, has the retention tab keeping substrate and the framework be arranged in the mode of surrounding described substrate in retention tab;

    Workbench, is arranged in described process chamber, has gas supplying holes in the mounting region of the described moving carrier of mounting;

    Electrostatic Absorption portion, is arranged in described workbench, carries out Electrostatic Absorption to described moving carrier;

    AndGas supply part, by the gas supplying holes supply gas via described workbench, carrys out auxiliary described moving carrier and departs from from workbench.

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