Isolation structure and method for producing same

Isolation structure and method for producing same

  • CN 105,172,293 A
  • Filed: 01/30/2009
  • Published: 12/23/2015
  • Est. Priority Date: 11/12/2008
  • Status: Active Application
First Claim
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1. an isolation structure, comprising:

  • A layer be made up of fluoropolymer in fact, this fluoroplymer layer has a first type surface, and wherein this first type surface is C-process, exposes the corona discharge of this first type surface in organic gas atmosphere;

    AndCover a polymer layer on the first type surface of this fluoroplymer layer;

    Wherein this isolation structure this polymer layer to be not more than at the temperature of about 380 °

    F heat can the corresponding polymer layer of seam to the second isolation structure to provide seam between this isolation structure and this second isolation structure, and wherein this isolation structure is measured according to ASTMF739 and is had for hazardous chemicals the chemical permeation being greater than about hour and run through detection time.

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