The vapor deposition monitoring device and method and film vapor deposition device and method of film

The vapor deposition monitoring device and method and film vapor deposition device and method of film

  • CN 105,177,521 B
  • Filed: 10/15/2015
  • Issued: 09/07/2018
  • Est. Priority Date: 10/15/2015
  • Status: Active Grant
First Claim
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1. a kind of vapor deposition monitoring device of film, wherein be monitored, wrap to the vapor deposition of the film using at least two evaporation sourcesIt includes:

  • The thickness of film thickness gauge, the film to being deposited using above-mentioned at least two evaporation source is measured;

    Resistance measurement device measures the resistance of above-mentioned film;

    AndComputing unit, the thickness measured by above-mentioned film thickness gauge based on above-mentioned film and the electricity measured by above-mentioned resistance measurement deviceResistance, calculates the concentration of the material of the evaporation source in above-mentioned at least two evaporation source in above-mentioned film,Thickness and resistance of the above-mentioned computing unit based on above-mentioned film, the resistivity of above-mentioned film is found out using formula (1), (2),Formula (1):

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