Easy-clean surface and method of making the same

Easy-clean surface and method of making the same

  • CN 105,209,179 A
  • Filed: 04/28/2014
  • Published: 12/30/2015
  • Est. Priority Date: 05/17/2013
  • Status: Active Application
First Claim
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1. a method for moisture film coating easy to clean is provided on base material, said method comprising the steps of:

  • A) abrasive product is used to grind the surface of base material at least partially, to provide the surface roughness R had in the scope of 10 nanometer to 3500 nanometers athrough grinding surface;

    B) make can the described surface through grinding of application type composition contact at least partially, wherein saidly can comprise silicon dioxide granule by application type composition, and wherein said silicon dioxide granule has the particle mean size of 100nm or less;

    AndC) water can be removed, to provide described moisture film coating easy to clean on the substrate by application type composition from described at least in part.

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