Overlapping pattern projecting apparatus

Overlapping pattern projecting apparatus

  • CN 105,319,811 B
  • Filed: 07/21/2015
  • Issued: 07/28/2017
  • Est. Priority Date: 07/28/2014
  • Status: Active Grant
First Claim
Patent Images

1. a kind of photoelectric device, including:

  • Semiconductor substrate;

    The array of optical emitters arranged with two-dimensional pattern on substrate;

    Projecting lens, the projecting lens is installed on a semiconductor substrate and is configured to collect and focuses on by optical launcherThe light sent, the light beam with the baseline light pattern to determining deviation is included to project, on the baseline light pattern and substrateThe two-dimensional pattern of optical launcher is corresponding;

    AndDiffraction optical element, the diffraction optical element is arranged on substrate and is configured to produce and projects with than describedMultiple overlapping duplicates of the baseline light pattern of the finer synthesising pattern density of the spacing of baseline light pattern.

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