Light resistance improver

Light resistance improver

  • CN 105,324,438 B
  • Filed: 10/17/2013
  • Issued: 11/06/2020
  • Est. Priority Date: 04/17/2013
  • Status: Active Grant
First Claim
Patent Images

1. Use of a fluorine-containing resin for improving or improving the light resistance of an aromatic polyetherketone resin,wherein the fluorine-containing resin is at least 1 kind of tetrafluoroethylene copolymer selected from the group consisting of a copolymer of tetrafluoroethylene and other perfluoroolefin, a copolymer of tetrafluoroethylene and perfluoro (alkyl vinyl ether), and a copolymer of tetrafluoroethylene, other perfluoroolefin and perfluoro (alkyl vinyl ether), and the proportion of tetrafluoroethylene in the tetrafluoroethylene copolymer is 55 to 99.5 wt%, and the usage proportion of the fluorine-containing resin is 20 parts by weight or less relative to 100 parts by weight of the aromatic polyetherketone resin, and the fluorine-containing resin forms a dispersed phase having an average particle diameter of 0.01 to 2 μ

  • m and an average interparticle distance of 5 μ

    m or less.

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