Spacer making method, substrate, display panel and display device

Spacer making method, substrate, display panel and display device

  • CN 105,549,273 A
  • Filed: 02/03/2016
  • Published: 05/04/2016
  • Est. Priority Date: 02/03/2016
  • Status: Active Application
First Claim
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1. make a method for chock insulator matter, it is characterized in that, comprising:

  • Substrate is formed chock insulator matter material film;

    Described chock insulator matter material film is at least double exposed, and the area part of arbitrary neighborhood double exposure is overlapping or not overlapping;

    Remove the chock insulator matter material in unexposed region in described chock insulator matter material film.

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