Gate conductor layer and manufacturing method thereof

Gate conductor layer and manufacturing method thereof

  • CN 105,632,910 A
  • Filed: 03/31/2015
  • Published: 06/01/2016
  • Est. Priority Date: 03/31/2015
  • Status: Active Application
First Claim
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1. the method manufacturing grid conductor layer, including:

  • Filled conductive material powder in the groove limited by grid side wall;

    AndThe conducting material powder filled is carried out laser annealing, and to form conductive material layer, described conductive material layer forms described grid conductor layer.

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