Pore structure and array substrate, manufacturing methods of pore structure and array substrate, detection device and display device

Pore structure and array substrate, manufacturing methods of pore structure and array substrate, detection device and display device

  • CN 105,742,238 A
  • Filed: 03/02/2016
  • Published: 07/06/2016
  • Est. Priority Date: 03/02/2016
  • Status: Active Application
First Claim
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1. a manufacture method for pore structure, including:

  • Underlay substrate is formed the first initial film;

    Described first initial film is carried out the first photoetching process to form the first film and to be arranged in the first hole of described the first film by the graph area utilizing mask plate, and wherein, described first hole has opening in the surface away from described underlay substrate of described the first film;

    Form the second initial film covering described the first film;

    AndDescribed second initial film is carried out the second photoetching process to form the second thin film and to run through described second thin film and the second hole connected with described first hole by the described graph area utilizing described mask plate, wherein, described second hole has near the first opening of described underlay substrate with away from the second opening of described underlay substrate, and described second opening is sized larger than described first opening size on described preset direction on the preset direction being parallel to described underlay substrate.

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