Method of forming a high resolution organic thin film pattern

Method of forming a high resolution organic thin film pattern

  • CN 105,742,495 A
  • Filed: 01/05/2011
  • Published: 07/06/2016
  • Est. Priority Date: 01/11/2010
  • Status: Active Grant
First Claim
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1. the method forming organic thin film patterns, the method includes:

  • Substrate is formed the first organic layer;

    Optionally remove a part for described first organic layer by optionally irradiating luminous energy to described first organic layer, and the remainder of described first organic layer is formed as sacrifice layer;

    Forming the second organic layer on the whole surface of described substrate and described sacrifice layer, described second organic layer utilizes deposition process to be formed;

    AndBy utilizing sacrifice layer described in removal of solvents to peel off the second organic layer formed on described sacrifice layer, and remaining second organic layer is formed as the second organic layer pattern;

    Wherein when forming the first organic layer, described first organic layer includes fluoro-based polymers, and described fluoro-based polymers is the compound represented by chemical formula 1 below or 2;

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