METHOD AND APPARATUS FOR AN INTEGRATED CAPACITOR

METHOD AND APPARATUS FOR AN INTEGRATED CAPACITOR

  • CN 105,789,187 A
  • Filed: 01/12/2016
  • Published: 07/20/2016
  • Est. Priority Date: 01/12/2015
  • Status: Active Application
First Claim
Patent Images

1. an equipment, including:

  • Substrate, it includes dielectric layer;

    First electrode, it includes forming the conductive material in the first groove of described substrate, and wherein said dielectric layer is between described first electrode and described substrate;

    AndSecond electrode, it includes forming the conductive material in the second groove of described substrate, and wherein said dielectric layer is between described second electrode and described substrate.

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