Metal doping of amorphous carbon and silicon films used as hardmasks in substrate processing systems

Metal doping of amorphous carbon and silicon films used as hardmasks in substrate processing systems

  • CN 105,845,551 A
  • Filed: 02/03/2016
  • Published: 08/10/2016
  • Est. Priority Date: 02/03/2015
  • Status: Active Application
First Claim
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1. for the method depositing metal-doped amorphous carbon hard mask film, comprising:

  • Substrate is arranged in the process chamber;

    Supply carrier gas is to described process chamber;

    Supply hydrocarbon precursor gases is to described process chamber;

    Supply precursor gases based on metal to described process chamber;

    Plasma is made to produce or supply plasma is to the one in described process chamber at described process chamber;

    AndDeposit metal-doped amorphous carbon hard mask film over the substrate.

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