Metal doping of amorphous carbon and silicon films for use as hard masks in substrate processing systems
Metal doping of amorphous carbon and silicon films for use as hard masks in substrate processing systems
- CN 105,845,551 B
- Filed: 02/03/2016
- Issued: 01/01/2021
- Est. Priority Date: 02/03/2015
- Status: Active Grant
- EN CH
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- Pin
