Method And System For Cleaning Wafer And Scrubber

Method And System For Cleaning Wafer And Scrubber

  • CN 105,931,945 A
  • Filed: 07/27/2015
  • Published: 09/07/2016
  • Est. Priority Date: 02/26/2015
  • Status: Active Application
First Claim
Patent Images

1. for a method for cleaning wafer, including:

  • Wafer scrubber is used to clean described wafer;

    Described wafer scrubber is moved in the cleanout fluid of agitation;

    In the cleanout fluid of described agitation, produce between described wafer scrubber and scavenger station and connectTouch;

    AndAfter cleaning described wafer scrubber by the cleanout fluid of described agitation, washed by described waferWash device and clean described wafer or the second wafer.

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