Plasma resistant electrostatic clamp

Plasma resistant electrostatic clamp

  • CN 105,993,070 A
  • Filed: 02/04/2015
  • Published: 10/05/2016
  • Est. Priority Date: 02/12/2014
  • Status: Active Application
First Claim
Patent Images

1. the device supporting substrate, it is characterised in that including:

  • Pedestal;

    Insulated part, neighbouring described pedestal, configure to support the surface of described substrate;

    AndElectrode system, it is provided that clamp voltage gives described substrate;

    Wherein configure described insulated part with provide via at least one passage gas to described substrate, describedAt least one passage has the product of channel width, the gas pressure of wherein said gas and described channel widthLess than the handkerchief Shen minima of described gas, wherein said handkerchief Shen minima is that the breakdown voltage of described gas isThe spacing on the surface of minima lower casing and the product of pressure.

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