Apparatus for supporting a substrate and method of operating an electrostatic chuck

Apparatus for supporting a substrate and method of operating an electrostatic chuck

  • CN 105,993,070 B
  • Filed: 02/04/2015
  • Issued: 01/22/2021
  • Est. Priority Date: 02/12/2014
  • Status: Active Grant
First Claim
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1. An apparatus for supporting a substrate, comprising:

  • a base;

    an insulating portion adjacent to the pedestal configured to support a surface of the substrate;

    an electrode system providing a clamping voltage to the substrate; and

    a voltage supply configured to supply an alternating voltage to the electrode system, wherein a frequency of the alternating voltage is 15Hz or less,wherein the insulating portion is configured to provide a gas to the substrate via at least one channel having a channel width, wherein a product of a gas pressure of the gas and the channel width is less than a Paschen minimum for the gas, wherein the Paschen minimum is a product of a spacing and a pressure of a surface of the enclosure at which a breakdown voltage of the gas is a minimum, wherein the channel comprises an electrically grounded conductive channel coating.

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