The gap using film based on carbon is filled

The gap using film based on carbon is filled

  • CN 106,067,440 A
  • Filed: 04/21/2016
  • Published: 11/02/2016
  • Est. Priority Date: 04/21/2015
  • Status: Active Application
First Claim
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1. a method, comprising:

  • Introduce process gas to the high density plasma CVD accommodating the substrate with gap(HDP CVD) room, wherein said process gas includes hydrocarbon reactants and has at least 4;

    1'"'"'sH;

    C ratio;

    AndReact by the HDP CVD of described process gas and fill described gap with film based on carbon.

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