Chemical vapor deposition coating, article, and method

Chemical vapor deposition coating, article, and method

  • CN 106,319,477 A
  • Filed: 10/26/2010
  • Published: 01/11/2017
  • Est. Priority Date: 10/27/2009
  • Status: Active Application
First Claim
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1. a thermal chemical vapor deposition method, including:

  • In reative cell decompose dimethylsilane thus the molecule fragment of dimethylsilane is deposited in reative cell all cruellyOn the surface of dew;

    Wherein said decomposition is under the pressure of 1.0p.s.i.a. to 100p.s.i.a. and at a temperature of 300 DEG C to 600 DEG CContinue the time of 30 minutes to 24 hours.

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