Color film substrate and manufacturing method thereof, display device and manufacturing method thereof

Color film substrate and manufacturing method thereof, display device and manufacturing method thereof

  • CN 106,647,005 B
  • Filed: 02/04/2017
  • Issued: 08/20/2021
  • Est. Priority Date: 02/04/2017
  • Status: Active Grant
First Claim
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1. A manufacturing method of a color film substrate is characterized by comprising the following steps:

  • manufacturing and forming a metal layer and a first alignment mark on a first side of a substrate, wherein the metal layer comprises a touch electrode layer, and the first alignment mark is made of an opaque metal material;

    wherein, the preparation of the first side at the substrate base plate forms metal level and first counterpoint mark, includes;

    depositing a metal layer on one side of the substrate base plate;

    performing patterning treatment on the metal layer once, and forming the touch electrode layer and the first alignment mark on the substrate base plate;

    manufacturing and forming a second alignment mark on a second side of the substrate base plate, wherein the second alignment mark is made of a transparent material, a vertical projection of the first alignment mark on the substrate base plate is completely overlapped with a vertical projection of the second alignment mark on the substrate base plate, and the first side and the second side are two opposite sides of the substrate base plate;

    wherein, the second side preparation formation of substrate base plate includes;

    depositing a transparent film layer on the second side of the substrate base plate;

    determining a vertical projection area of the first alignment mark on the substrate base plate by using a machine station to serve as a target area, performing alignment by using the machine station according to a central point of the target area, performing patterning treatment on the transparent film layer after the alignment is completed, forming a second alignment mark at the position of the target area on the substrate base plate, and etching the transparent film layer except the second alignment mark;

    depositing a film layer for forming a black matrix layer on the second side of the substrate base plate and the second alignment mark, wherein the film layer of the black matrix layer covers the surface of the second alignment mark;

    forming a step difference of the film layer on the second side by including an overlapping area of the film layer and the second alignment mark and an area of the film layer only on the second side of the substrate, wherein the thickness of the second alignment mark is greater than or equal to that of the second alignment mark

    And detecting the section difference of the film layer on the second side of the substrate base plate by using a machine table, and aligning according to the section difference.

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