Manufacturing method of array substrate, array substrate and display device

Manufacturing method of array substrate, array substrate and display device

  • CN 107,195,540 B
  • Filed: 06/05/2017
  • Issued: 01/26/2021
  • Est. Priority Date: 06/05/2017
  • Status: Active Grant
First Claim
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1. A manufacturing method of an array substrate is used for manufacturing two film patterns which are positioned adjacent to each other to form a required pattern, and is characterized by comprising the following steps:

  • sequentially forming a first photoresist layer and a second photoresist layer on a substrate, wherein the refractive index of the first photoresist layer is smaller than that of the second photoresist layer;

    exposing the substrate on which the first photoresist layer and the second photoresist layer are formed by adopting incident light beams which penetrate through a mask and have oblique light rays at the edges;

    developing the substrate subjected to the exposure treatment to form a step-shaped developed pattern layer;

    carrying out curing treatment on the developed pattern layer;

    under the condition that the incident light beams are converged light beams, the first photoresist layer and the second photoresist layer are positive photoresists;

    or, in the case that the incident light beam is a divergent light beam, the first photoresist layer and the second photoresist layer are negative photoresists;

    the first photoresist layer forms a pixel defining layer after curing treatment, and the second photoresist layer forms a photoetching gap column layer after curing treatment;

    the thickness of the first photoresist layer is 1.0-2.0 μ

    m, and the thickness of the second photoresist layer is 1.0-2.0 μ

    m;

    the refractive index of the first photoresist layer is 1.0-1.4, and the refractive index of the second photoresist layer is 1.5-1.8.

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