Manufacturing method of array substrate, array substrate and display device

Manufacturing method of array substrate, array substrate and display device

  • CN 107,195,659 B
  • Filed: 05/27/2017
  • Issued: 07/24/2020
  • Est. Priority Date: 05/27/2017
  • Status: Active Grant
First Claim
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1. A manufacturing method of an array substrate comprises the following steps:

  • providing a substrate base plate;

    forming a semiconductor layer on the substrate base plate;

    depositing an etching barrier layer material on the semiconductor layer;

    forming a mask pattern on the etching barrier material;

    wet etching is carried out on the etching barrier layer material by taking the mask pattern as a mask to form an etching barrier layer;

    dry etching the semiconductor layer using the mask pattern as a mask to form an active layer,the active layer comprises a first area and a second area surrounding the first area, and the orthographic projection of the etching barrier layer on the substrate is completely overlapped with the orthographic projection of the first area of the active layer on the substrate.

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