A kind of processing chamber and semiconductor processing equipment

A kind of processing chamber and semiconductor processing equipment

  • CN 108,962,713 A
  • Filed: 05/25/2017
  • Published: 12/07/2018
  • Est. Priority Date: 05/25/2017
  • Status: Active Application
First Claim
Patent Images

1. a kind of processing chamber, the processing chamber is used to carry out chip degassing and prerinse, the chamber include:

  • cavity,Electrode plate, the heat source for being set to the cavity inner top, the pedestal for being set to bottom in the cavity;

    Wherein, the pedestal andThe heat source is oppositely arranged, and the electrode plate is rotatable;

    It is characterized in that,Gas distribution channel is provided in the electrode plate;

    When the electrode plate is rotated to the top of the pedestal, process gas warpThe gas distribution channel is delivered to the top of the pedestal, carries out pre-cleaning processes to chip;

    When the electrode plate is rotated away from instituteWhen stating the top of pedestal, connects the heat source and degassing technique is carried out to chip.

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