Method and device using ArF photoresist

Method and device using ArF photoresist

  • CN 1,187,495 A
  • Filed: 12/31/1997
  • Published: 07/15/1998
  • Est. Priority Date: 12/31/1997
  • Status: Abandoned Application
First Claim
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1. photoresist multipolymer, it be by the vinylene carbonate polymerization of the maleic anhydride of the dicyclo ene compound of one or more formulas II, formula III or formula IV:

  • (formula II) Wherein R represents hydrogen or contains that 1-10 replaces or the straight or branched alkyl of unsubstituted carbon atom, and n is 1 or 2,(formula III) (formula IV)

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