Photoetching projector and reflector assembly for said device

Photoetching projector and reflector assembly for said device

  • CN 1,495,528 A
  • Filed: 08/13/2003
  • Published: 05/12/2004
  • Est. Priority Date: 08/15/2002
  • Status: Active Application
First Claim
Patent Images

1. the reflector arrangement (10) that is used for reflecting electromagnetic radiation, this reflector arrangement (10) comprises at least one first reverberator (21) and one second reverberator (22), described first transmitter (21) and described second reverberator (22) extend along optical axis (O) direction, has reflecting surface (26,27) and the back side (24,25), in this device (10), perpendicular to optical axis (O) and with described reverberator (21,22) dotted line of Xiang Jiaoing (L), locate to intersect in first distance (r1) of distance optical axis (O) with described first reverberator (21), locate to intersect at the second distance (r2) of distance optical axis (O) with described second reverberator (22), first distance (r1) is greater than second distance (r2), cut off by second reverberator (22) by the light that a bit produces on the optical axis, and reflex on the reflecting surface of first reverberator (21), this light is determined described reverberator (21,22) high radiation intensity area between (zh) and low radiation intensity zone (zl) is characterized in that a structure (31) is positioned on the back side (25) of second reverberator (22) of hypo-intense region (zl) position.

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