Photolithography using single light shield in multiple etching steps

Photolithography using single light shield in multiple etching steps

  • CN 1,523,638 A
  • Filed: 02/18/2003
  • Published: 08/25/2004
  • Est. Priority Date: 02/18/2003
  • Status: Active Application
First Claim
Patent Images

1. a micro-photographing process that uses single light shield to be used for multiple etching is characterized in that, comprises:

  • Provide a ground and a photoresist layer to be positioned on this ground;

    With a light shield this photoresist layer is exposed;

    Toast this photoresist layer;

    AndThis photoresist layer is developed to form the shade of a multiple etching.

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