For controlling technique and the product produced thereby of uniformity of film

For controlling technique and the product produced thereby of uniformity of film

  • CN 1,555,424 B
  • Filed: 08/19/2002
  • Issued: 12/02/2015
  • Est. Priority Date: 08/23/2001
  • Status: Active Grant
First Claim
Patent Images

1. , in a method for deposition on substrate film, comprise the following steps:

  • There is provided pedestal, it is arranged in treatment chamber;

    First indirect heating element and the second internal heating element are provided, wherein this first heating unit is positioned under the neighboring area of the upper surface of described pedestal, and this second heating unit be positioned at the described upper surface of described pedestal described neighboring area inside a region under;

    There is provided the first thermopair, it is positioned at expression first heating unit provides the region of an energy position to it, and wherein said first thermopair produces a temperature reading;

    There is provided the second thermopair, it is positioned at expression second heating unit provides the region of an energy position to it, and wherein said second thermopair produces a temperature reading;

    There is provided heater controller, it is connected in order to provide the first electric current to described first heating unit and to provide the second electric current to described second heating unit;

    AndDescribed substrate is fixed on described pedestal;

    Wherein, described heater controller, after being fixed on pedestal by described substrate, controls described first and second electric currents, with the scope making the described temperature reading of described first thermopair be in high 10 DEG C to 20 DEG C of the described temperature reading than described second thermopair.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×