Multilayer reflective extreme ultraviolet lithography mask blanks

Multilayer reflective extreme ultraviolet lithography mask blanks

  • CN 1,580,957 A
  • Filed: 07/30/2004
  • Published: 02/16/2005
  • Est. Priority Date: 07/31/2003
  • Status: Active Grant
First Claim
Patent Images

1. method comprises:

  • Formation has multilayer laminated deep uv lithography blank;

    Be formed on described non-ruthenium laying on multilayer laminated;

    AndBe formed on the ruthenium protective seam on the described laying.

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