Spincoating antireflection paint for photolithography

Spincoating antireflection paint for photolithography

  • CN 1,606,713 B
  • Filed: 11/15/2001
  • Issued: 07/06/2011
  • Est. Priority Date: 11/15/2001
  • Status: Active Grant
First Claim
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1. absorbability spin coating glass composition, it comprises at least a silane reaction thing, at least a organic absorbing compounds, the acid and the potpourri of water and as the gamma-amino alkyltrialkoxysilaneand of pH regulator agent, wherein said organic absorbing compounds is absorbed in the light in the wide wavelength coverage of the 5nm at least at the wavelength place that is lower than 375nm consumingly and comprises at least one phenyl ring and reaction active groups, and this reaction active groups is selected from the silicyl of hydroxyl, amido, carboxylic acid group and replacement.

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